Si on SiC Engineered Substrate
Si (Silicon) on SiC (Silicon Carbide) engineered substrate, fabricated via bonding and thinning or H-Cut technology, leverages the high thermal conductivity and radiation resistance of SiC to effectively mitigate self-heating effects. By combining the advantages of both Si and SiC, it demonstrates significant application potential across multiple high-growth sectors.
Si on SiC Engineered Substrate

  • Items
  • Specification
  • Diameter
  • 150±0.2 mm
  • Si Orientation
  • <100>, <110>, <111>, etc.
  • Si Type
  • P/N
  • Transfer Si Layer Thickness
  • ≥0.1 μm
  • Front Roughness
  • Ra ≤ 0.2 nm (5 μm * 5 μm)
  • SiC Polytope
  • 4H
  • SiC Resistivity
  • 0.015~0.025/≥1E8 ohm·cm
  • Edge Chip, Scratch, Crack (visual inspection)
  • None
  • TTV
  • ≤5 μm
  • Thickness
  • 350/500±25 μm
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